Nomogram for accurate and quantitative prediction of the risk of psoriatic arthritis in Chinese adult patients with moderate and severe plaque psoriasis.

Journal: European Journal Of Dermatology : EJD
Published:
Abstract

Background: Psoriatic arthritis (PsA) is an inflammatory form of arthritis that appears approximately 7-10 years after psoriasis and remains undiagnosed in most of patients. Currently, only a few quantitative and succinct PsA-risk prediction models are available.

Objective: The aim of this study was to establish and validate a prediction model for quantitatively assessing the risk of PsA in moderate and severe plaque psoriasis patients.

Methods: A non-interventional and cross-sectional study was conducted. Demographic, clinical, and laboratory records were collected and blindly reviewed. Logistic regression was used to develop this prediction model. With C-index and calibration curve, internal validation was performed. Five-fold cross validation, external validation and decision curve analysis (DCA) were also applied to assess this model.

Results: Among 405 patients, 111 patients had PsA. Arthralgia (OR = 39.346; 95% CI: 20.139-82.579), C-reactive protein (OR = 2.008; 95% CI: 1.051-3.838), lymphocyte level (OR = 0.341; 95% CI: 0.177-0.621), hypertension (OR = 0.235; 95% CI: 0.077-0.660) and disease duration (OR = 1.033; 95% CI: 0.998-1.071) were identified as potential predictors affecting the risk of transition from moderate and severe PsO to PsA. C-index for the prediction nomogram was 0.911 (95% CI: 0.879-0.943), and was confirmed to be 0.905 through 1000-time bootstrapping internal validation. Cross validation and external validation were preformed and proved the accuracy and generalizability of this prediction model.

Conclusions: This study establishes a quantitative predictive nomogram with good predictive power for assessing the risk of PsA in patients with moderate and severe PsO.

Authors
Zerong Chen, Yiyi Wang, Xiaomeng Lan, Min Yang, Li Ding, Gaojie Li, Peizhen Hong, Yinling Bai, Yi Liu, Wei Li